Plasma etching of proton-exchanged lithium niobate H. Hu Department of Physics, University of Paderborn, D-33095 Paderborn, Germany A. P. Milenin Max PlanckInstitute of. Accession number;03A0847364 Title;Stoichiometric lithium niobate single crystal growth and etching characterization: Author; ZHENG Y (Kochi Univ.). Related Product: System100 Technology: Parallel Plate System; Cooled substrate electrode; 13.56 MHz Plasma Excitation; Results: Rate : ca. 3 nm/min.
Lithium Niobate is a useful synthetic material for integrated optical devices such as wideband electro. All lithium niobate etching solutions and the rinse water from the first four rinses must be captured, labeled as Hazardous Waste, and picked up by. Eindhoven, The Netherlands, June 11-13, 2008 Etching of Lithium Niobate: From Ridge Waveguides to Photonic Crystal Structures H. Hui, R. Ricken and W. Sohler Angewandte Physik. Authors: H. Hu, R. Ricken, W. Sohler, R. B. Wehrspohn. We report a modification in the etching characteristics of lithium niobate (LiNbO3) single crystals induced by irradiating the crystal surface with pulsed UV laser light at. The fabrication of LiNbO ridge waveguides etched by a mixture of HF and HNO using chromium (Cr) stripes.
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